포토리소그래피 분해능 및 초점 심도(DOF) 계산기

This calculator computes the resolution (minimum printable feature size) and the 초점 심도 (DOF) for an optical exposure system used in microfabrication and semiconductor lithography.

Equations

분해능 (HP) (R): R = k₁ × λ NA

초점 심도 (DOF): DOF = k₂ × λ NA²

λ: Exposure 파장 (λ), NA: Numerical Aperture, k₁, k₂: Empirical Process Factors

Input Form

Output Panel

Default Preview (ArF Immersion)

분해능 (HP) (R):

40.03 nm

초점 심도 (DOF):

52.95 nm