Photolithography Resolution & Depth of Focus (DOF) Calculator

This calculator computes the resolution (minimum printable feature size) and the Depth of Focus (DOF) for an optical exposure system used in microfabrication and semiconductor lithography.

Equations

Resolution (R): R = k₁ × λ NA

Depth of Focus (DOF): DOF = k₂ × λ NA²

λ: Exposure Wavelength, NA: Numerical Aperture, k₁, k₂: Empirical Process Factors

Input Form

Output Panel

Default Preview (ArF Immersion)

Resolution (R):

40.03 nm

Depth of Focus (DOF):

52.95 nm